High-Performance P-Type Independent-Gate FinFETs

Abstract

We present, to our knowledge, the first successful integration of two independent gates on a p-type FinFET. These results also represent a significant performance improvement over previously reported Independent-Gate FinFET results. The devices have gate lengths ranging from 0.5 to 5 μm, and designed fin thicknesses ranging from 25 to 75 nm. Electrical results show near-ideal subthreshold slopes in double-gate mode (both gates modulated simultaneously). Independent-Gate operation is also examined by modulating saturated drain current with both front and back-gate voltages independently. The results are compiled to analyze performance trends versus fin thickness and gate length.