A study of highly scalable DG-FinDRAM

Abstract

This letter reports the scalability of a capacitor-less 1T-DRAM, and proposes a new concept about extending the use of 1T-DRAM to gate lengths of less than 50 nm. Superior characteristics such as long retention time and large sense margin even for gate lengths around 50 nm can be obtained with a double-gate fully depleted FinFET DRAM. Considering capacity, speed, power, and structural complexity of embedded memory, the capacitor-less 1T-DRAM has the possibility of playing the leading role among other memories.