Processing and Characterization of Silica Xerogel Films for Low-K Dielectric Applications - Concepedia

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Processing and Characterization of Silica Xerogel Films for Low-K Dielectric Applications

14

Citations

26

References

1999

Year

Anurag Jain, Svetlana Rogojevic, Satya Nitta, V. Pisupatti, William N. Gill, Peter Wayner, Joel L. Plawsky, T. E. F. M. Standaert, G. S. Oehrlein

MRS Proceedings

Materials ScienceMaterial AnalysisEngineeringSilica Xerogel FilmsApplied PhysicsMaterial InnovationLow-k Dielectric ApplicationsSol-gel SynthesisElectrical InsulationMaterial Preparation

References

	Year	Citations

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