Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena · 2009 · 23 citations · 1 references
EngineeringChemical EngineeringSemiconductor DevicesSeparation ProcessesSurface EngineeringChemical CleaningCleaning OperationsCleanroom ProcessingMechanical CleaningSpray DepositionSurface CleaningCleaningNozzle CleaningSeparation Of Fine ParticlesSilicon Wafer ProcessingSpray NozzlesSteam-aided CleaningSurface CleanersWafer Cleaning
A novel cleaning technique using steam-water mixed spray is proposed. Relatively low-pressure super-purified steam (0.1 MPa - 0.2 MPa) is mixed with super-purified water in a nozzle, and then sprayed on a silicon wafer surface, which is located at approximately 10 mm from the nozzle. The most striking result of this proposed technique is that we are able to clean a wafer surface, i.e., to eliminate fine particles, without using any chemicals.
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Impact of high-speed steam-droplet spray on solid surface
Toshiyuki Sanada, Masao Watanabe, Minori Shirota et al. · Fluid Dynamics Research · 2008 · 32 citations