Modeling of defects in integrated circuit photolithographic patterns

Abstract

In a previous paper by the same author the foundation was laid for the theory of photolithographic defects in integrated circuits. This paper expands on the earlier one and shows how to calculate the critical areas and probability of failure for dense arrays of wiring. The results are used to determine the nature of the defect size distribution with electronic defect monitors. Several statistical techniques for doing this are described and examples are given.