Concepedia

Development of preferred orientation in polycrystalline AlN thin films deposited by rf sputtering system at low temperature

Alejandro B. Rodríguez‐Navarro, Wilfredo Otaño, Juan Manuel Garcı́a-Ruiz, R. Messier, L. J. Pilione

Journal of materials research/Pratt's guide to venture capital sources · 1997 · 44 citations · 18 references

DOI

Concepts

References

18

A Direct Method of Determining Preferred Orientation of a Flat Reflection Sample Using a Geiger Counter X-Ray Spectrometer

L. G. Schulz · Journal of Applied Physics · 1949 · 825 citations

, , +15

Preparation of c-Axis Oriented AlN Thin Films by Low-Temperature Reactive Sputtering

Hiroshi Okano, Yusuke Takahashi, Toshiharu Tanaka et al. · Japanese Journal of Applied Physics · 1992 · 123 citations

, , +15

Quantitative ion beam process for the deposition of compound thin films

J. M. E. Harper, J. J. Cuomo, H. T. G. Hentzell · Applied Physics Letters · 1983 · 119 citations

, , +14

Microstructure and properties of rf-sputtered amorphous hydrogenated silicon films

R. C. Ross, R. Messier · Journal of Applied Physics · 1981 · 114 citations

, , +17

Stress dependence of reactively sputtered aluminum nitride thin films on sputtering parameters

G. L. Huffman, D. E. Fahnline, R. Messier et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1989 · 84 citations

, , +15