IEEE Transactions on Magnetics · 1994 · 17 citations · 7 references
Natural SciencesMaterials SciencePhysicsMagnetic MaterialsMaterials CharacterizationMetallic MaterialsAmorphous MaterialsFerromagnetic MaterialsFerromagnetismMagnetic AnisotropyMagnetic Properties Of SolidsThin Film Magnetic PropertiesAmorphous Magnetic FilmsAnisotropyCoercivityElectron Probe MicroanalysisIn-plane Magnetic AnisotropyMagnetic CoercivityMagnetoelastic AnisotropySputter Deposition
We present magnetic and magnetoelastic data measured from a wide range of amorphous films grown by RF sputter deposition. The films were deposited in HV conditions at sputtering pressures of 5 to 80 mTorr and power densities of 1.6 and 3.2 W/cm/sup 2/. Compositions were measured by electron probe micro-analysis (EPMA) and found to be similar to the target material at pressures of 20 mTorr. This pressure also gave the minimum coercivity and minimum stress corresponding to a transition from compressive to tensile stress. All films exhibited in-plane anisotropy, the origin of which is the stray induction from the target magnetron magnets.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">></ETX>
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