Uniform, Axial‐Orientation Alignment of One‐Dimensional Single‐Crystal Silicon Nanostructure Arrays

Abstract

Neatly scratching the surface: A facile etching technique assisted by a silver-nanoparticle network to produce large-area 1D silicon nanostructure arrays with desired orientation and doping characteristics is demonstrated (see picture). A mechanism for the highly selective etching is proposed on the basis of experimental evidence.