Publication | Closed Access
Multibit Operation of $\hbox{TiO}_{x}$ -Based ReRAM by Schottky Barrier Height Engineering
107
Citations
12
References
2011
Year
Materials EngineeringSemiconductorsElectrical EngineeringElectronic DevicesEngineeringSchottky Barrier Height-Based ReramSemiconductor TechnologyEmerging Memory TechnologyElectronic MemoryApplied PhysicsSchottky BarrierOptoelectronic DevicesSemiconductor MemoryMicroelectronicsMultibit OperationSemiconductor Device
We demonstrated multibit operation using a 250-nm Ir/TiO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">x</sub> / TiN resistive random access memory by Schottky barrier height engineering. A Schottky barrier was formed by the interface between a high-work-function Ir top electrode and n-type TiO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">x</sub> . The conducting path, which was composed of oxygen vacancies, was generated in a low-resistance state, whereas a Schottky barrier was reproduced in a high-resistance state (HRS) due to the high concentration of oxygen by the electric field. By changing the reset operation voltage, we successfully engineered the Schottky barrier height, resulting in the modulation of the HRS current and demonstrating the feasibility of multibit applications.
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