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Noise parameters of InP-based double heterojunction base-collector self-aligned bipolar transistors
18
Citations
4
References
1999
Year
Electrical EngineeringEngineeringEmitter AreaHigh-frequency DeviceElectronic EngineeringHigh Cutoff FrequenciesApplied PhysicsBias Temperature InstabilityNoiseMicroelectronicsNoise PerformancesNoise ParametersSemiconductor Device
The noise performances of a new base-collector self-aligned technology of double-heterojunction single-finger InGaAs-InP bipolar transistor are investigated at 300 K. Noise parameter variations are studied versus frequency in the 2-18 GHz range, versus collector current and emitter area. A low minimum noise figure F <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">min</sub> =0.6 dB is demonstrated at 2 GHz with a 4.8-μm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> emitter. Variations of F <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">min</sub> show a minimum versus collector current. The high cutoff frequencies of the devices limit the increase of F <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">min</sub> versus frequency.
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