Publication | Closed Access
Hot-carrier reliability in submicrometer 40V LDMOS transistors with thick gate oxide
33
Citations
16
References
2005
Year
Unknown Venue
Electrical EngineeringEngineeringHardware ReliabilityLdmos TransistorsKirk EffectStress-induced Leakage CurrentBias Temperature InstabilityApplied PhysicsSubmicrometer 40VCircuit ReliabilityDevice ReliabilityMicroelectronicsHot-carrier ReliabilitySemiconductor Device
The hot-carrier reliability in thick gate oxide LDMOS transistors is presented for the first time and two distinct behaviors are found. First, higher V/sub gs/ stressing results in a greater degradation because of the Kirk effect. Second, AC lifetime is much longer than DC lifetime because of the recovery in degradation.
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