Publication | Closed Access
High-frequency characterization of sub-0.25-/spl mu/m fully depleted silicon-on-insulator MOSFETs
17
Citations
7
References
2000
Year
Fdsoi MosfetsElectrical EngineeringGate LengthEngineeringHigh-frequency CharacterizationPhysicsHigh-frequency DeviceRf SemiconductorElectronic EngineeringBias Temperature InstabilityApplied PhysicsCutoff FrequencyIntegrated CircuitsSilicon On InsulatorMicroelectronicsMicrowave Engineering
A cutoff frequency, f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">T</sub> , of 85 GHz was measured on a fully-depleted silicon-on-insulator (FDSOI) n-MOSFET with a gate length of 0.15 μm. The p-MOSFET with 0.22-μm gate length has an f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">T</sub> of 42 GHz. The high-frequency equivalent circuits were derived from scattering parameters for MOSFETs with various gate lengths. The effects of gate length and other device parameters on the performance of FDSOI MOSFETs at RF are discussed.
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