IEEE Photonics Technology Letters · 1991 · 39 citations · 5 references
EngineeringElectrical EngineeringMicroelectronicsPhotonicsSemiconductor DevicesIntegrated Circuit DevicesIntegrated Circuit FabricationIntegrated OpticsIntegrated PhotonicsPhotonic Integrated CircuitsSilicon MaterialsIntegrated Optical WaveguidesIntegrated WaveguidesSilicon DioxideSilicon WaveguidesSilicon-on-insulator ProcessingSilicon-on-insulator TechnologyWaveguide IntegrationWaveguiding
A SiO/sub 2/-Si-SiO/sub 2/-Si-SiO/sub 2/-Si structure produced by the separation by implantation of oxygen (SIMOX) process used for dual vertically integrated waveguiding in silicon at lambda =1.3 mu m is discussed. Independent waveguiding is observed when 2- mu m-thick Si cores are separated by 0.36- mu m-thick SiO/sub 2/. Coupled waveguiding is found for an 0.12- mu m intercore oxide thickness.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">></ETX>
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Optical waveguides in SIMOX structures
B.L. Weiss, Graham T. Reed, Shoichi Toh et al. · IEEE Photonics Technology Letters · 1991 · 48 citations
Silicon antiresonant reflecting optical waveguides
Richard Soref, K. J. Ritter · Optics Letters · 1990 · 26 citations