The effect of gate leakage on the noise figure of AlGaN/GaN HEMTs

C. Sanabria, A. Chakraborty, Hongtao Xu, M.J.W. Rodwell, Umesh K. Mishra, R.A. York

IEEE Electron Device Letters · 2005 · 114 citations · 17 references

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Abstract

The effect of gate leakage on the noise figure of AlGaN/GaN high electron mobility transistor (HEMTs) is explored. It is shown that these devices have a sizable amount of gate leakage that cannot be ignored when measuring their noise performance. Measurements across a single sample have more than 1 dB of variation in minimum noise figure. We will show this variation is because of gate leakage. A modified van der Ziel model is used to predict this large variation and allows easy noise figure prediction of HEMT and MESFET devices.

References

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