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Deposition of device quality silicon nitride with ultra high deposition rate (>7 nm/s) using hot-wire CVD

DOI

17

Citations

8

References

2007

Year

V. Verlaan, Z.S. Houweling, C.H.M. van der Werf, I.G. Romijn, A.W. Weeber, H.D. Goldbach, R.E.I. Schropp
Thin Solid Films

References

YearCitations

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