Holographic interference lithography for integrated optics

W. Ng, Chi-Shain Hong, A. Yariv

IEEE Transactions on Electron Devices · 1978 · 65 citations · 23 references

Concepts

Abstract

In this paper, some of our recent work in the use of holographic interference lithography and various material removal techniques to corrugate thin-film optical waveguides are reviewed. The specific applications of these periodic thin-film devices in the distributed feedback and distributed Bragg reflector semiconductor laser, and as output grating couplers, are described. Recent results in the use and fabrication of chirped and curved-line gratings are also summarized.

References

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