Marker Experiments for the moving Species in Silicides During Solid Phase Epitaxy of Evaporated Si

Growth kinetics of planar binary diffusion couples: ’’Thin-film case’’ versus ’’bulk cases’’

U. Gösele, K. N. Tu · Journal of Applied Physics · 1982 · 568 citations

Natural Sciences, Materials Engineering, Materials Science +17

Implanted noble gas atoms as diffusion markers in silicide formation

S.S. Lau, J. W. Mayer, Helmut Müller et al. · Thin Solid Films · 1975 · 266 citations

Natural Sciences, Materials Engineering, Materials Science +5

Diffusion in intermetallic compounds with the CaF2 structure: A marker study of the formation of NiSi2 thin films

F. M. d’Heurle, S. Petersson, Lars Stolt et al. · Journal of Applied Physics · 1982 · 126 citations

Natural Sciences, Materials Engineering, Materials Science +14

Metallurgical and electrical properties of chromium silicon interfaces

Alexandre Souto Martinêz, D. Estève, A. Guivarc’h et al. · Solid-State Electronics · 1980 · 60 citations

Natural Sciences, Materials Engineering, Materials Science +14

Marker experiments for diffusion in the silicide during oxidation of PdSi, Pd2Si, CoSi2, and NiSi2 films on 〈Si〉

M. Bartur, M.−A. Nicolet · Journal of Applied Physics · 1983 · 57 citations

Natural Sciences, Materials Engineering, Materials Science +17