Plasma processes under vacuum conditions

Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline Targets

Peter Sigmund · Physical Review · 1969 · 3.5K citations

Natural Sciences, Physics, Atomic Physics +13

Substitutional doping of amorphous silicon

P. G. Le Comber · Solid State Communications · 1975 · 1.1K citations

Engineering, Materials Engineering, Materials Science +14

Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline Targets

Peter Sigmund · Physical Review · 1969 · 792 citations

Natural Sciences, Physics, Atomic Physics +13

rf-plasma deposited amorphous hydrogenated hard carbon thin films: Preparation, properties, and applications

A. Bubenzer, B. Dischler, G. B. Brandt et al. · Journal of Applied Physics · 1983 · 500 citations

Natural Sciences, Materials Science, Physics +17

The design of plasma etchants

Daniel Flamm, Vincent M. Donnelly · Plasma Chemistry and Plasma Processing · 1981 · 310 citations

Natural Sciences, Electrical Engineering, Materials Science +12