Highly conductive transparent F-doped tin oxide films were prepared by photo-CVD and thermal-CVD

Tadashi Ishida, Osamu Tabata, Jung il Park, Sung Ho Shin, Hiroyuki Magara, Shigeharu Tamura, Shoichi Mochizuki, Toshiyuki Mihara

Thin Solid Films · 1996 · 26 citations · 5 references

Concepts

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