Reversibility of recombination-induced defect reactions in amorphous Si:H

Abstract

Recombination-induced defect reactions are reversible in principle; i.e., any recombination (or trapping) process that induces defect formation can also induce recovery of that defect. This reversibility principle applies to crystalline and amorphous semiconductors. Although the rates in the two directions are generally quite different, evidence is cited indicating that in hydrogenated amorphous silicon they may be comparable, and offer new explanations for several observations. Illustrative rate equations are presented along with a series of testable experimental predictions.