Nanofabrication of grating and dot patterns by electron holographic lithography

Abstract

Line and dot patterns with about a 100 nm period are exposed on poly-methyl methacrylate (PMMA) resist by electron holographic lithography with a W〈100〉 thermal field emission (TFE) gun and an electron biprism. Subsequent atomic force microscope (AFM) observation has confirmed that both patterns are successfully fabricated. This technique allows one to produce nanoscale periodic patterns simultaneously, whose spacing could be, in principle, comparable to a lattice spacing.