Nanopatterning of perovskite manganite thin films by atomic force microscope lithography

Abstract

Atomic force microscopy (AFM) lithography has been performed in La0.8Ba0.2MnO3 (LBMO) films. Unexpectedly, controllable nano-sized patterns can be obtained with an excellent reproducibility under a negative sample bias rather than a positive one, which is completely different from doped SrTiO3 and high TC superconductors, though they are of similar perovskite structure. The size of AFM lithography patterns can be controlled well by the sample bias and the selection of tips. Compared to the non-patterned region, AFM lithography patterns exhibit different mechanical, electrical, even possible magnetic properties. Moreover, a simple wet etching can transfer AFM lithography patterns into nano-grooves with a high etching selectivity and without destroying the physical properties of LBMO thin films. It is expected that various spintronic nano-devices will be fabricated with perovskite manganites by AFM lithography and etching techniques.