Publication | Closed Access
Sub10nm silicon field emitters produced by electron beam lithography and isotropic plasma etching
23
Citations
3
References
1995
Year
Electrical EngineeringPlasma ElectronicsEngineeringElectron-beam LithographyPhysicsMicrofabricationNanoelectronicsIsotropic PlasmaBeam LithographyApplied PhysicsMicroelectronicsPlasma EtchingOptoelectronicsPlasma ProcessingElectron Beam Lithography
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