Reaction Mechanism for Deposition of Silicon Nitride by Hot-Wire CVD with Ultra High Deposition Rate(>7 nm/s) - Concepedia

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Reaction Mechanism for Deposition of Silicon Nitride by Hot-Wire CVD with Ultra High Deposition Rate(>7 nm/s)

10

Citations

18

References

2006

Year

V. Verlaan, Zomer Silvester Houweling, Karine van der Werf, H.D. Goldbach, R.E.I. Schropp

MRS Proceedings

Materials ScienceEngineeringSurface ScienceApplied PhysicsReaction MechanismSemiconductor Device FabricationChemical DepositionSilicon On InsulatorChemical Vapor DepositionThin Film ProcessingHot-wire CvdSilicon Nitride

References

	Year	Citations

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