Transparent, conducting indium tin oxide films formed on low or medium temperature substrates by ion-assisted deposition

Abstract

An ion-assisted evaporation process is described for the formation of ITO films on substrates that cannot be heated beyond 150 degrees C. Refractive indices and absorption coefficients were measured in the visible part of the spectrum for some of the films. The resistivity of the films varied between 0.7 and 8 x 10(-3) Omega cm, depending on the process parameters. The properties were uniform over 25-cm diam areas.