Ion energy distributions in a pulsed plasma doping system

Abstract

Discharge parameters in a pulsed dc plasma doping system have been studied using measurements of time-resolved ion energy distributions, relative ion density, plasma potential, and electron temperature in BF3 and Ar plasmas during active discharge and afterglow periods. Negative plasma potentials are observed when using a hollow cathode to create a plasma while implanting at ultralow energies (<500eV). The kinetics of ion generation and decay in BF3 during the pulse on and off periods have been discussed.