Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2000 · 19 citations · 6 references
EngineeringMaterials EngineeringMaterials ScienceOptoelectronicsSemiconductor DevicesSemiconductor MaterialsOptical Properties Of SemiconductorsQuantum OptoelectronicsQuantum WellsSemiconductor Device MaterialsSemiconductor HeterostructuresSemiconductor PhysicsBuffer LayersQuantum Well GrowthQuantum Well HeterostructuresQuantum Well ModulatorsQuantum Well StructuresStrain EffectsStrained Quantum WellsStrained-layer Heterostructures
In this work we compare the effect of the buffer layer on the device quality and surface morphology of strained InGaAs/AlGaAs PIN multiple quantum well (MQW) modulators. We examine GaAs buffer layers and linearly graded InGaAs buffer layers. Our results indicate that for lower indium concentrations in the quantum wells (less than about 23%) better device performance and surface morphology are obtained by growing directly on GaAs. PIN MQWs with indium mole fractions higher than about 24% have better properties when a linearly graded buffer layer is used.
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