Transmission properties of nanoscale aperture arrays in metallic masks on optical fibers

Abstract

We report the optical studies of nanohole arrays in metallic coatings on cleaved optical fibers and also on glass substrates. Nanoholes are produced using electron-beam lithography and range in size from 100to700nm; the pitch is varied from 300to3000nm. Transmission properties are examined using visible (632.8nm) and infrared (1550nm) laser light. The observed interference patterns are determined by array symmetry, nanohole diameter, and pitch. Results from the optical fibers are compared with larger array areas fabricated on bulk glass substrates. In all cases the results are simulated using near- and intermediate-field diffraction theory with good agreement.