Applied Physics Letters · 2000 · 139 citations · 18 references
EngineeringMaterials EngineeringMaterials ScienceElectronic MaterialsSemiconductor DevicesSpectroscopyIii-v SemiconductorsSemiconductor PhysicsSurface PassivationWide Band Gap SemiconductorsWide-bandgap Semiconductor DevicesWide-bandgap SemiconductorsDeep-level DefectsDeep-level ImpuritiesGallium Nitride (Gan) MaterialsHydrogen PassivationMetal-organic Chemical Vapor DepositionMetalorganic Chemical Vapor DepositionNitride PassivationPassivation Mechanisms
Differential postgrowth hydrogen passivation of deep levels in n–GaN grown by metal-organic chemical vapor deposition has been directly observed by means of both deep level transient spectroscopy and deep level optical spectroscopy. Two deep levels found at Ec−Et=0.62 and 1.35 eV show strong H passivation effects, with their concentrations decreasing by a factor of ⩾30 and ∼14, respectively. The decrease in the 0.62 eV trap concentration together with its correlation with the presence of Mg in n–GaN is consistent with Mg–H complex formation. A band of closely spaced deep levels observed at Ec−Et=2.64–2.80 eV narrows to Ec−Et=2.74–2.80 eV after hydrogenation, consistent with hydrogen complexing with VGa3− defects as anticipated by earlier theoretical results. Finally, a deep level at Ec−Et=3.22 eV likely related to background acceptors remains unaffected by hydrogen.
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