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Lowering the Switching Current of Resistance Random Access Memory Using a Hetero Junction Structure Consisting of Transition Metal Oxides
82
Citations
9
References
2006
Year
Materials ScienceMaterials EngineeringElectrical EngineeringNon-volatile MemoryEngineeringHetero Junction StructureTransition Metal OxidesMicrofabricationNanoelectronicsApplied PhysicsComputer ArchitectureMemory DeviceSemiconductor MemoryLow Resistance StateMicroelectronicsPhase Change MemorySwitching Current
Both lowering the "reset" current of resistance random access memory (ReRAM) and raising the resistance in the low resistance state are crucial for practical use of ReRAM. These requirements have been satisfied by using a hetero junction structure consisting of transition metal oxides, NiOy/TiOx/Pt, combining direct contact with the NiOy using a W-probe. It is considered that this configuration brought about extreme downsizing of the effective area of both the top and bottom electrodes for NiOy and thus decreased the number of filaments formed in "forming" process. Reducing the number of filaments is essential to these issues.
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