Codoping characteristics of Zn with Mg in GaN

Abstract

The doping characteristics of Mg–Zn codoped GaN films grown by metalorganic chemical vapor deposition are investigated. By means of the concept of Mg–Zn codoping technique, we have grown p-GaN showing a low electrical resistivity (0.72 Ω cm) and a high hole concentration (8.5×1017 cm−3) without structural degradation of the film. It is thought that the codoping of Zn atoms with Mg raises the Mg activation ratio by reducing the hydrogen solubility in p-GaN. In addition, the measured specific contact resistance of Mg–Zn codoped GaN film is 5.0×10−4 Ω cm2, which is one order of magnitude lower than that of Mg doped only GaN film (1.9×10−3 Ω cm2).