Publication | Closed Access
Magnetic properties of ZnMnO films grown at low temperature by atomic layer deposition
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Citations
13
References
2006
Year
Magnetic PropertiesEngineeringThin Film Process TechnologyChemical DepositionMagnetic MaterialsMagnetismManganese PrecursorsMagnetic Thin FilmsAtomic Layer DepositionThin Film ProcessingMaterials ScienceMaterials EngineeringZnmno LayersOxide ElectronicsNanomanufacturingMagnetic MaterialFerromagnetismNatural SciencesZnmno FilmsApplied PhysicsThin FilmsMagnetic PropertyChemical Vapor Deposition
The authors demonstrate that by lowering deposition temperature of ZnMnO films (T<500°C) they can avoid Mn clustering and creation of inclusions of Mn oxides, which are frequently formed in ZnMnO layers grown by high temperature methods. Low temperature growth is achieved using atomic layer deposition and organic zinc and manganese precursors.
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