Applied Physics Letters · 1984 · 73 citations · 2 references
EngineeringMaterials EngineeringMaterials ScienceElectronic MaterialsSemiconductor DevicesSemiconductor MaterialsEpitaxial GrowthSemiconductor Crystal GrowthSemiconductor Device MaterialsSemiconductor PhysicsSemiconductor SurfacesSemiconductor Thin FilmsEpitaxial Film GrowthEpitaxial MaterialsMolecular Beam EpitaxyMolecular Beam Epitaxy NucleationPhotoluminescencePhotoluminescence SpectroscopySingle-crystal SemiconductorsSurface Contamination
Epitaxial layers of GaAs and AlxGa1−x As (0.2≤x≤0.5) have been grown directly on single-crystal Si (100) substrates, without an intermediate Ge layer, by molecular beam epitaxy (MBE). To improve nucleation, after being chemically cleaned the Si substrates were preheated in the MBE system to reduce surface contamination and achieve ordered surface reconstruction prior to growth. Reflection electron diffraction, Rutherford backscattering channeling, and photoluminescence measurement were used to characterize the epitaxial layers. The AlGaAs layers were found to be superior to the GaAs layers.
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GaAs Shallow-homojunction solar cells on Ge-coated Si substrates
R. P. Gale, J. C. C. Fan, B-Y. Tsaur et al. · IEEE Electron Device Letters · 1981 · 85 citations
Heteroepitaxy of vacuum-evaporated Ge films on single-crystal Si
B-Y. Tsaur, M. W. Geis, John C. C. Fan et al. · Applied Physics Letters · 1981 · 72 citations