Remote plasma-enhanced CVD of silicon: Reaction kinetics as a function of growth parameters - Concepedia

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Remote plasma-enhanced CVD of silicon: Reaction kinetics as a function of growth parameters

37

Citations

2

References

1990

Year

B. Anthony, Tsan‐sheng Hsu, L. Breaux, Ruizhe Qian, Sanjay K. Banerjee, A.F. Tasch

Journal of Electronic Materials

Electrical EngineeringEngineeringRemote Plasma-enhanced CvdSurface ScienceApplied PhysicsReaction KineticsNonthermal PlasmaPlasma ApplicationPlasma ProcessingSilicon On InsulatorGrowth Parameters

References

	Year	Citations

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