Electron beam nanofabrication with self-assembled monolayers of alkylthiols and alkylsiloxanes

Abstract

Self-assembled monolayers have been demonstrated to perform as high-resolution electron beam resists with minimum resolutions of <20nm for 50keV electron beams and <15nm for 10eV electrons from a scanning tunneling microscope. The resulting patterns have been transferred into many substrates by both wet and dry etching.