An XPS comparative study on thermal oxide barrier formation on Nb and NbN thin films

Page 1

	Year	Citations
ESCA studies of some niobium compounds M. K. Bahl Journal of Physics and Chemistry of Solids Inorganic ChemistryNiobium CompoundsChemistryNitrosative StressInorganic Compound	1975	191
Auger electron spectroscopy and X-ray photoelectron spectroscopy studies of the oxidation of polycrystalline tantalum and niobium at room temperature and low oxygen pressures J. M. Sanz, S. Hofmann Journal of the Less Common Metals Materials ScienceInorganic ChemistryRoom TemperatureEngineeringOxidation Resistance	1983	98
Thermal Oxidation of Niobium Nitride Films at Temperatures from 20°–400°C: I . The Surface Reaction R. P. Frankenthal, D. J. Siconolfi, W. Robert Sinclair, Journal of The Electrochemical Society Niobium Nitride FilmsEngineeringOxidation ResistanceCubic Boron NitrideThermal Oxidation	1983	25
Investigation of high rate magnetron sputtering of niobium films for Josephson integrated circuits J.C. Villégier, J. Veler IEEE Transactions on Magnetics EngineeringTunnel Junctions ElectrodesThin Film Process TechnologyMagnetismNanoelectronics	1983	17
X-ray photoelectron spectroscopic studies of niobum containing intermetallic compounds T. Novakov, T. H. Geballe Solid State Communications Materials ScienceInorganic ChemistryEngineeringIntermetallic CompoundsChemistry	1972	13

Page 1