Publication | Open Access
Thermal Oxidation of Niobium Nitride Films at Temperatures from 20°–400°C: I . The Surface Reaction
25
Citations
0
References
1983
Year
Niobium Nitride FilmsEngineeringOxidation ResistanceCubic Boron NitrideThermal OxidationChemistryOxidation ReactionChemical EngineeringReaction ProductRedox ChemistrySurface ReactionMaterials SciencePhysical ChemistryAuger Electron SpectroscopySurface ScienceApplied PhysicsThin FilmsChemical KineticsSurface Reactivity
The air oxidation of cubic has been studied by Auger electron spectroscopy at temperatures from ambient to 400°C. At temperatures of 180°C or less, only the first one or two monolayers are oxidized, the reaction product being an oxynitride of niobium. Above 200°C, oxidation is not limited and obeys a linear rate law. At these higher temperatures, the reaction product initially is an oxynitride but, as the reaction proceeds, eventually becomes . The reaction proceeds by the diffusion of oxygen through the reaction product to the interface. Grain boundary diffusion of oxygen into the is rapid and competes with the oxidation reaction.