Examination of the solubility and the molecular weight distribution of PMMA in view of an optimised resist system in deep etch x-ray lithography - Concepedia

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Examination of the solubility and the molecular weight distribution of PMMA in view of an optimised resist system in deep etch x-ray lithography

21

Citations

2

References

1993

Year

A. El‐Kholi, P. Bley, J. Göttert, Jürgen Mohr

Microelectronic Engineering

Materials ScienceMaterials EngineeringEngineeringSpecific ResistanceElectron-beam LithographyMicrofabricationBeam LithographyApplied PhysicsOptimised Resist SystemMolecular Weight DistributionMicroelectronicsPlasma EtchingNanolithography Method

References

	Year	Citations

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