Vacuum spectrophotometer for specular reflectance measurements at high temperature. Application to monocrystalline silicon

Abstract

A spectrophotometer is described which allows specular reflectance measurements at near normal and oblique incidence (30-44-60-75 degrees ). The samples can be heated up to 800 degrees C. The spectral range extends from 0.22 to 6.0 mu m. Reflectivity of monocrystalline silicon is presented at 20-300-500 and 700 degrees C.