Etch Characteristics of TiO2 Etched by Using an Atomic Layer Etching technique with BCl3 Gas and an Ar Neutral Beam - Concepedia

Concepedia

Publication | Closed Access

Etch Characteristics of TiO2 Etched by Using an Atomic Layer Etching technique with BCl3 Gas and an Ar Neutral Beam

27

Citations

0

References

2009

Year

Jae Beom Park, Woong Sun Lim, Sang Duk Park, Byoung Jae Park, Geun Young Yeom

Journal of the Korean Physical Society

Materials ScienceMaterials EngineeringAr Neutral BeamEngineeringApplied PhysicsEtch CharacteristicsTio2 EtchedMicroelectronicsPlasma Etching

No additional data available for this publication yet. Check back later!