Publication | Closed Access
Characterization of anhydrous HF gas-phase etching with CH3OH for sacrificial oxide removal
35
Citations
13
References
1998
Year
Materials ScienceMaterials EngineeringChemical EngineeringEngineeringSacrificial Oxide RemovalSurface ScienceChemistryPlasma EtchingAnhydrous Hf Gas-phase
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