On the electrical asymmetry effect in large area multiple frequency capacitively coupled plasmas

Abstract

Recently, many publications have dealt with the electrical asymmetry effect in capacitively coupled radio frequency-discharges. The idea of this concept is the possibility of controlling the self-bias voltage by tuning the relative phase of harmonics in relation to the fundamental wave. In this work, we apply the electrical asymmetry effect on a large-area multiple frequency capacitively coupled plasma used for reactive sputtering by varying the relative phase of the 13.56 and 27.12 MHz excitation. The resulting voltage waveforms at the electrode are recorded using a high-voltage probe. The shape of the waveform is then analysed by Fourier analysis to study the influence of higher harmonics excited at the non-linearity of the plasma boundary sheath. To investigate the influence of the relative phase on the plasma itself, radially resolved multipole resonance probe measurements are performed.