Japanese Journal of Applied Physics · 1993 · 12 citations · 5 references
EngineeringElectrical EngineeringMaterials ScienceMicroelectronicsMicrofabricationSemiconductor DevicesHigh-frequency Semiconductor DevicesIntegrated Circuit DesignNanoelectronicsThin-film TransistorsQuartzVacuum DepositionVacuum TechnologyVoltage
A new vacuum triode with a lateral field-emitter array (FEA) has been fabricated, and its characteristics have been measured. The emitter has an array of 3-µm-wide-edged rectangular tips made of a 0.25-µm-thick tungsten film deposited on a quartz substrate with 9 µm pitch. The emitter-to-gate and emitter-to-anode spacings were 0.5 µm and 5 µm, respectively. Emission and triode characteristics were measured. A transconductance of about 0.7 µS/150-tips were obtained at a gate voltage of 110 V and an anode voltage of 150 V. Device structure and characteristics are described.
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