Structural and optical investigations of SiOxNy thin films deposited by R.F. sputtering

Optical Properties and Electronic Structure of Amorphous Germanium

J. Tauc, R. Grigorovici, A. Vancu · physica status solidi (b) · 1966 · 10.7K citations

Natural Sciences, Materials Science, Physics +17

Determination of the thickness and optical constants of amorphous silicon

R. Swanepoel · Journal of Physics E Scientific Instruments · 1983 · 3.9K citations

Natural Sciences, Materials Engineering, Materials Science +17

Local atomic structure in thin films of silicon nitride and silicon diimide produced by remote plasma-enhanced chemical-vapor deposition

D. V. Tsu, G. Lucovsky, M. J. Mantini · Physical review. B, Condensed matter · 1986 · 307 citations

Natural Sciences, Chemistry, Materials Science +17

Characterization and optimization of zinc oxide films by r.f. magnetron sputtering

Kalpathy B. Sundaram, Arshad Khan · Thin Solid Films · 1997 · 237 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +9

Infrared optical properties of silicon oxynitride films: Experimental data and theoretical interpretation

Thomas Eriksson, Claes‐Göran Granqvist · Journal of Applied Physics · 1986 · 155 citations

Natural Sciences, Materials Science, Physics +17