Publication | Closed Access
Photo-electrochemical etching of free-standing GaN wafer surfaces grown by hydride vapor phase epitaxy
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Citations
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References
2015
Year
Wide-bandgap SemiconductorElectrical EngineeringEngineeringSurface ScienceApplied PhysicsAluminum Gallium NitrideGan Power DevicePhoto-electrochemical EtchingCategoryiii-v SemiconductorPlasma EtchingOptoelectronics
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