Publication | Closed Access
An XPS study of the SF6 reactive ion beam etching of silicon at low temperatures
23
Citations
23
References
1999
Year
Materials EngineeringMaterials ScienceElectrical EngineeringIon ImplantationLow TemperaturesEngineeringElectron-beam LithographyMicrofabricationNanoelectronicsApplied PhysicsSemiconductor Device FabricationElectronic PackagingSilicon On InsulatorMicroelectronicsPlasma EtchingXps Study
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