T. Chevolleau - Concepedia

Author

T. Chevolleau

Centre National de la Recherche Scientifique

Also Known As

T Chevolleau, T. Chevolleau, Th Chevolleau

Publications

267

Citations

H-Index

Concepts

All Affiliations

Centre National de la Recherche Scientifique Helmholtz-Zentrum Dresden-Rossendorf CEA Grenoble Laboratoire d'Électronique des Technologies de l'Information Nantes Université

About

T. Chevolleau is an author at Centre National de la Recherche Scientifique specializing in engineering, materials science, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	9	9	194
2	Applied Physics	5	5	104
3	Chemistry	3	3	58
4	Chemical Engineering	2	2	42
5	Natural Sciences	1	1	21

T. Chevolleau

Publications

212

Citations

H-Index

Page 1

	Year	Citations
Spectroellipsometric, AFM and XPS probing of stainless steel surfaces subjected to biological influences M. Vinnichenko, T. Chevolleau, M.T. Pham, Applied Surface Science Materials ScienceSurface CharacterizationEngineeringAnalytical InstrumentationCorrosion	2002	34
Etching of Si at low temperatures using a SF6 reactive ion beam: Effect of the ion energy and current density T. Chevolleau, Pierre‐Yves Tessier, Christophe Cardinaud, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringCurrent DensityIon Beam InstrumentationSilicon On InsulatorIon Implantation	1997	28
An XPS study of the SF6 reactive ion beam etching of silicon at low temperatures Pierre‐Yves Tessier, T. Chevolleau, Christophe Cardinaud, Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms Materials EngineeringMaterials ScienceElectrical EngineeringIon ImplantationLow Temperatures	1999	23
In situ ellipsometric investigation of stainless steel corrosion behavior in buffered solutions with amino acids M. Vinnichenko, M.T. Pham, T. Chevolleau, Applied Surface Science Materials ScienceCorrosion ProtectionEngineeringAmino AcidsCorrosion	2003	21
Effect of Cl2- and HBr-based inductively coupled plasma etching on InP surface composition analyzed using <i>in situ</i> x-ray photoelectron spectroscopy S. Bouchoule, L. Vallier, G. Patriarche, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringCl2-based IcpOptoelectronic DevicesIntegrated CircuitsSilicon On Insulator	2012	21
Mass spectrometry studies of resist trimming processes in HBr∕O2 and Cl2∕O2 chemistries Erwine Pargon, O. Joubert, T. Chevolleau, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Plasma Gas PhaseEngineeringVacuum DeviceChemistryCl2∕o2 Chemistries	2005	21
Ion flux, ion energy distribution and neutral density in an inductively coupled argon discharge T. Chevolleau, W. Fukarek Plasma Sources Science and Technology Electrical EngineeringEngineeringGlow DischargeNeutral DensityIon Energy Distribution	2000	19
Measurement of free radical kinetics in pulsed plasmas by UV and VUV absorption spectroscopy and by modulated beam mass spectrometry G. Cunge, P. Bodart, M. Brihoum, Plasma Sources Science and Technology	2012	18
Ni and Ti silicide oxidation for CMOS applications investigated by XRD, XPS and FPP Md. Khalilur Rahman, F. Nemouchi, T. Chevolleau, Materials Science in Semiconductor Processing Electrical EngineeringEngineeringOxidation ResistanceNanoelectronicsOxide Electronics	2017	16
Oxidation of N+ implanted silicon: optical and structural properties T. Chevolleau, A. Szekeres, S. Alexandrova Surface and Coatings Technology Materials ScienceIon ImplantationOptical MaterialsEngineeringApplied Physics	2002	11

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