Synthetic holograms written by a laser pattern generator

Abstract

A new pattern generator, initially designed for ASIC fabrication, is employed for writing synthetic holograms and other micro-optical components. The specifications and limits of this machine are investigated. Test structures and synthetic holograms are shown. Arbitrary patterns with micrometer resolution, submicrometer positioning accuracy, large area patterns (up to 150 x 150 mm² possible), and good quality microprofiles are demonstrated.