Ion chemistry in tetraethylorthosilicate (C2H5O)4Si

Silicon oxide deposition from tetraethoxysilane in a radio frequency downstream reactor: Mechanisms and step coverage

Nur Selamoglu, J. A. Mucha, D. E. Ibbotson et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1989 · 112 citations

Natural Sciences, Chemistry, Materials Science +13

Exact mass measurement by Fourier transform mass spectrometry

Edward B. Ledford, Sahba. Ghaderi, Robert L. White et al. · Analytical Chemistry · 1980 · 102 citations

Natural Sciences, Chemistry, Analytical Chemistry +9

Ion and chemical radical effects on the step coverage of plasma enhanced chemical vapor deposition tetraethylorthosilicate films

C.P. Chang, C. S. Pai, J. J. Hsieh · Journal of Applied Physics · 1990 · 65 citations

Natural Sciences, Materials Engineering, Materials Science +15

Sequential clustering reactions of SiD+3 with SiD4 and SiH+3 with SiH4: Another case of arrested growth of hydrogenated silicon particles

M. L. Mandich, W. D. Reents, K. D. Kolenbrander · The Journal of Chemical Physics · 1990 · 62 citations

Natural Sciences, Chemistry, Computational Chemistry +16

General phase modulation method for stored waveform inverse Fourier transform excitation for Fourier transform ion cyclotron resonance mass spectrometry

Shenheng Guan · The Journal of Chemical Physics · 1989 · 56 citations

Natural Sciences, Chemistry, Analytical Chemistry +16