Characterization of density profile of laser-produced Sn plasma for 13.5nm extreme ultraviolet source

Y. Tao, H. Nishimura, Shinsuke Fujioka, Atsushi Sunahara, M. Nakai, T. Okuno, Nasuo Ueda, Katsunobu Nishihara, N. Miyanaga, Yasukazu Izawa

Applied Physics Letters · 2005 · 45 citations · 8 references

Concepts

Abstract

We investigated the electron density profile corresponding to the dominant extreme ultraviolet (EUV) emission from a laser-produced Sn plasma using a combination of a green and an UV interferometer. A comparison between experimental results and a one-dimensional radiation hydrodynamic simulation shows reasonable agreement, and the discrepancy could be attributed to three-dimensional plasma expansion. It was found that, due to opacity effects, most of the EUV light comes from an under-dense plasma region.

References

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